ASTM F1761-2000(2005) 圆形磁射极板磁力线通过量的标准试验方法
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【英文标准名称】:StandardTestMethodforPassThroughFluxofCircularMagneticSputteringTargets
【原文标准名称】:圆形磁射极板磁力线通过量的标准试验方法
【标准号】:ASTMF1761-2000(2005)
【标准状态】:现行
【国别】:
【发布日期】:2000
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:F01.17
【标准类型】:(TestMethod)
【标准水平】:()
【中文主题词】:
【英文主题词】:magneticdatastoragemedia;magneticfield;magneticsputteringtargets;passthroughflux;sputtering;sputteringtarget
【摘要】:Itisstandardpracticetousemagnetroncathodesputterdepositionsourcesinmanufacturingthinfilmmagneticdatastoragemedia.Butaferromagneticsputteringtargettendstoshuntasputteringcathodersquo;magneticfield,thusreducingtheefficiencyofthesputteringprocess.Makersofsputteringtargetshavedevelopedvariousmeansofcontrollingalloymicrostructuretominimizetheundesirablecathodeshuntingeffect.Becauseoftheirdifferingmanufacturingmethods,however,thetargetsofonesuppliermayhavemagneticpropertiessignificantlybetterorworsethanthoseofanother,evenwhenthealloycompositionsarethesame.Thistestmethodpermitscomparingthemagneticshuntingpowerofmagnetictargetsunderastandardtestcondition.Theresultsareusefultosputteringtargetsuppliersandbuyersinpredictingtargetperformance,inspecifyingtargetquality,andinqualifyingincomingtargetshipments.Thistestmayalsobeusefulinquantifyingtargetimprovementefforts.Manufacturingprocessstepsthatloweratargetmaterialrsquo;magneticpermeabilitytendtoincreasethePTF,andviceversa.ItwouldinprinciplebepossibletopredictthePTFbyaccumulatingsufficientpermeabilitydata,andknowingthetargetthicknessandthefieldintensityofthemagneticassemblyusedformagnetronsputtering.1.1Thistestmethodcoversmeasuringthedcmagneticfieldtransmittedthroughaferromagneticsputteringtarget("passthroughflux"or"PTF").Inthistestmethodthesourcemagneticfieldisinthetesttarget''scircumferentialdirection.1.2Planardisk-shapedtargetsinthediameterrange5to8in.inclusive(125to205mminclusive)andofthickness0.1to0.5in.inclusive(2.5to13mm)maybecharacterizedbythisprocedure.1.3Thistestmethodisalsoapplicabletotargetshavinganopencenter,forexample,totargets5-in.outsidediameterby2.5-in.insidediameterby0.25-in.thick(127-mmoutsidediameterby63.5-mminsidediameterby6.35-mmthick).1.4Targetsofvariousdiametersandthicknessesareaccommodatedbysuitablefixturingtoalignthepieceundertestwiththesourcemagnetmountedinthetestfixture.Tooling,coveringseveralpopulartargetdesignsisspecifiedinthisprocedure.Additionaltargetconfigurationsmaybetestedbyprovidingspecialtooling.Whenspecialfixturingisusedallpartiesconcernedwiththetestingmustagreetothetestsetup.1.5Thevaluesstatedininch-poundunitsaretoberegardedasthestandard.Thevaluesgiveninparenthesesareforinformationonly.1.6Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:A55
【国际标准分类号】:77_040_20
【页数】:11P.;A4
【正文语种】:
【原文标准名称】:圆形磁射极板磁力线通过量的标准试验方法
【标准号】:ASTMF1761-2000(2005)
【标准状态】:现行
【国别】:
【发布日期】:2000
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:F01.17
【标准类型】:(TestMethod)
【标准水平】:()
【中文主题词】:
【英文主题词】:magneticdatastoragemedia;magneticfield;magneticsputteringtargets;passthroughflux;sputtering;sputteringtarget
【摘要】:Itisstandardpracticetousemagnetroncathodesputterdepositionsourcesinmanufacturingthinfilmmagneticdatastoragemedia.Butaferromagneticsputteringtargettendstoshuntasputteringcathodersquo;magneticfield,thusreducingtheefficiencyofthesputteringprocess.Makersofsputteringtargetshavedevelopedvariousmeansofcontrollingalloymicrostructuretominimizetheundesirablecathodeshuntingeffect.Becauseoftheirdifferingmanufacturingmethods,however,thetargetsofonesuppliermayhavemagneticpropertiessignificantlybetterorworsethanthoseofanother,evenwhenthealloycompositionsarethesame.Thistestmethodpermitscomparingthemagneticshuntingpowerofmagnetictargetsunderastandardtestcondition.Theresultsareusefultosputteringtargetsuppliersandbuyersinpredictingtargetperformance,inspecifyingtargetquality,andinqualifyingincomingtargetshipments.Thistestmayalsobeusefulinquantifyingtargetimprovementefforts.Manufacturingprocessstepsthatloweratargetmaterialrsquo;magneticpermeabilitytendtoincreasethePTF,andviceversa.ItwouldinprinciplebepossibletopredictthePTFbyaccumulatingsufficientpermeabilitydata,andknowingthetargetthicknessandthefieldintensityofthemagneticassemblyusedformagnetronsputtering.1.1Thistestmethodcoversmeasuringthedcmagneticfieldtransmittedthroughaferromagneticsputteringtarget("passthroughflux"or"PTF").Inthistestmethodthesourcemagneticfieldisinthetesttarget''scircumferentialdirection.1.2Planardisk-shapedtargetsinthediameterrange5to8in.inclusive(125to205mminclusive)andofthickness0.1to0.5in.inclusive(2.5to13mm)maybecharacterizedbythisprocedure.1.3Thistestmethodisalsoapplicabletotargetshavinganopencenter,forexample,totargets5-in.outsidediameterby2.5-in.insidediameterby0.25-in.thick(127-mmoutsidediameterby63.5-mminsidediameterby6.35-mmthick).1.4Targetsofvariousdiametersandthicknessesareaccommodatedbysuitablefixturingtoalignthepieceundertestwiththesourcemagnetmountedinthetestfixture.Tooling,coveringseveralpopulartargetdesignsisspecifiedinthisprocedure.Additionaltargetconfigurationsmaybetestedbyprovidingspecialtooling.Whenspecialfixturingisusedallpartiesconcernedwiththetestingmustagreetothetestsetup.1.5Thevaluesstatedininch-poundunitsaretoberegardedasthestandard.Thevaluesgiveninparenthesesareforinformationonly.1.6Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:A55
【国际标准分类号】:77_040_20
【页数】:11P.;A4
【正文语种】:
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